CrN
CrN Chromium Nitride Material for Advanced Energy and Thin Film Applications
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CrN
Chromium Nitride
CrN
CrN
Chromium Nitride (CrN)
Product Description
CrN is a high performance ceramic nitride material composed of chromium and nitrogen, widely used in semiconductor manufacturing, thin film deposition, protective coatings, and advanced surface engineering applications. These materials are valued for their excellent hardness, superior wear resistance, outstanding corrosion resistance, and exceptional thermal stability.
Product Specifications
Composition: Cr, N (Chromium Nitride)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
CrN Materials
High purity CrN material is designed for semiconductor manufacturing, thin film deposition, and advanced coating applications. CrN belongs to the family of transition metal nitride materials widely used in wear-resistant coatings, cutting tools, semiconductor processing equipment, and corrosion-resistant surfaces.
These materials are engineered to provide excellent hardness, oxidation resistance, chemical durability, and thermal stability. By carefully controlling material purity and microstructure, CrN materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, protective coating technologies, and thin film deposition processes.
Applications of CrN Materials
CrN materials are widely used in advanced semiconductor and industrial technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Wear-resistant and protective coatings
- Semiconductor processing equipment
- Cutting tools and industrial tooling
- Corrosion-resistant surface treatments
- Advanced materials research and development
The ability to control the composition of CrN allows engineers and researchers to optimize hardness, wear resistance, corrosion resistance, and thermal stability for specialized applications.
CrN Sputtering Targets for Thin Film Deposition
CrN sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality nitride thin films with excellent hardness, oxidation resistance, and chemical durability. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using CrN sputtering targets are commonly applied in semiconductor devices, protective coatings, cutting tools, industrial machinery, MEMS components, and advanced engineering systems.
Notice: Pioneer Materials can manufacture custom CrN sputtering targets and nitride materials according to specific customer requirements, including tailored purity, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for CrN Materials
Contact Pioneer Materials to learn more about our high purity CrN materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, protective coating, industrial engineering, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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