FeCoB

FeCoB Iron Cobalt Boron Alloy Material for Advanced Energy and Thin Film Applications

BiTeSe Thermoelectric Material Sputtering Target

Iron Cobalt Boron Alloy

FeCoB

FeCoB

Iron Cobalt Boron Alloy (FeCoB)

Product Description

FeCoB is a soft magnetic alloy material composed of iron, cobalt, and boron, widely used in magnetic devices, spintronic technologies, semiconductor applications, and thin film deposition. These materials are valued for their high magnetic saturation, low coercivity, excellent electrical properties, and outstanding thermal stability.

Product Specifications

Composition: Fe, Co, B (various atomic ratios)
Purity: 99.99%
Density: 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1mm, thickness: ±0.1mm
Surface Roughness: 32RMS

FeCoB Materials

High purity FeCoB material is designed for semiconductor manufacturing, thin film deposition, and advanced magnetic applications. FeCoB belongs to the family of soft magnetic alloy materials widely used in spintronic devices, MRAM technologies, magnetic sensors, and microelectronic systems.

These materials are engineered to provide high magnetic saturation, excellent soft magnetic behavior, and reliable electrical performance. By carefully controlling composition and structure, FeCoB materials can be optimized for both research and industrial applications.

This material is commonly used in advanced electronics, semiconductor research, magnetic memory devices, and thin film deposition processes.

Applications of FeCoB Materials

FeCoB materials are widely used in advanced semiconductor and magnetic technologies.

Common applications include:

  • Magnetic random access memory (MRAM)
  • Magnetic tunnel junctions (MTJs)
  • Spintronic devices
  • Magnetic sensors
  • Thin film deposition and sputtering targets
  • Semiconductor and thin film research
  • Advanced materials research and development


The ability to control the composition of FeCoB allows engineers and researchers to optimize magnetic saturation, coercivity, and electrical performance for specialized applications.

FeCoB Sputtering Targets for Thin Film Deposition

FeCoB sputtering targets are used in thin film deposition processes to produce high quality soft magnetic alloy films. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.

Thin films produced using FeCoB sputtering targets are commonly applied in MRAM devices, spintronic components, magnetic sensors, and next-generation microelectronic technologies.

Notice: Pioneer Materials can manufacture custom sputtering targets and compound materials according to specific customer requirements, including tailored density, composition, and dimensions.

Request a Quote for FeCoB Materials

Contact Pioneer Materials to learn more about our high purity FeCoB materials and custom sputtering targets. Our team can provide tailored compositions, dimensions, and manufacturing solutions designed to meet your research or industrial requirements.

Request a Quote

Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.

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