Chromium Sputtering Targets
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Chromium Sputtering Targets
Chromium (Cr)
Product Description
Chromium sputtering targets are high purity metallic materials designed for thin film deposition in semiconductor manufacturing, optical coatings, microelectronics, and advanced industrial applications. Chromium is valued for its excellent adhesion properties, corrosion resistance, hardness, electrical conductivity, and thermal stability.
Product Specifications
Composition: Cr (Chromium)
Purity: 99.95% (higher purities available upon request)
Density: 99% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1mm, thickness: ±0.1mm
Surface Roughness: 32RMS
Chromium Materials
High purity chromium material is designed for semiconductor manufacturing, physical vapor deposition (PVD), and advanced coating applications. Chromium belongs to the family of refractory transition metals widely used in microelectronics, optical devices, and wear-resistant coatings.
These materials are engineered to provide excellent adhesion, oxidation resistance, corrosion resistance, and stable electrical performance. By carefully controlling material purity and processing conditions, chromium sputtering targets can be optimized for both research and industrial applications.
This material is commonly used in semiconductor devices, decorative coatings, optical components, and thin film deposition processes.
Applications of Chromium Materials
Chromium materials are widely used in advanced semiconductor and industrial technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Adhesion layers for multilayer thin films
- Diffusion barrier coatings
- Optical coatings
- Wear-resistant and corrosion-resistant coatings
- Microelectronics and integrated devices
- Advanced materials research and development
The high purity and excellent physical properties of chromium enable engineers and researchers to produce durable, conductive, and high-performance thin films for specialized applications.
Chromium Sputtering Targets for Thin Film Deposition
Chromium sputtering targets are used in magnetron sputtering and other PVD processes to deposit high quality metallic films with excellent adhesion and uniformity. These targets enable precise control of film composition and thickness, making them ideal for research laboratories, semiconductor manufacturing environments, and industrial coating systems.
Thin films produced using chromium sputtering targets are commonly applied in semiconductor devices, optical coatings, decorative finishes, hard coatings, and electronic components.
Notice: Pioneer Materials can manufacture custom chromium sputtering targets according to specific customer requirements, including tailored purity, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for Chromium Sputtering Targets
Contact Pioneer Materials to learn more about our high purity chromium sputtering targets. Our team can provide customized target compositions, dimensions, bonding options, and manufacturing solutions designed to meet your research, semiconductor, optical coating, and industrial thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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