B₄C
B₄C Boron Carbide Material for Advanced Energy and Thin Film Applications
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B₄C
Boron Carbide
B₄C
B₄C
Boron Carbide (B₄C)
Product Description
B₄C is a high performance ceramic material composed of boron and carbon, widely used in semiconductor manufacturing, thin film deposition, protective coatings, and advanced engineering applications. These materials are valued for their exceptional hardness, excellent wear resistance, high thermal stability, low density, and superior chemical resistance.
Product Specifications
Composition: B, C (Boron Carbide)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
B₄C Materials
High purity B₄C material is designed for semiconductor manufacturing, thin film deposition, and advanced coating applications. B₄C belongs to the family of ultra-hard ceramic materials widely used in protective coatings, semiconductor equipment, neutron absorption systems, and wear-resistant components.
These materials are engineered to provide excellent hardness, thermal stability, and chemical durability. By carefully controlling material purity and microstructure, B₄C materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, protective coating technologies, and thin film deposition processes.
Applications of B₄C Materials
B₄C materials are widely used in advanced industrial and semiconductor technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Wear-resistant and protective coatings
- Semiconductor processing equipment
- Neutron absorption and nuclear applications
- High temperature engineering components
- Advanced materials research and development
The ability to control the purity of B₄C allows engineers and researchers to optimize hardness, wear resistance, thermal stability, and coating performance for specialized applications.
B₄C Sputtering Targets for Thin Film Deposition
B₄C sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality ceramic thin films with excellent hardness, chemical resistance, and thermal stability. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using B₄C sputtering targets are commonly applied in protective coatings, semiconductor devices, optical components, high wear industrial systems, and advanced engineering applications.
Notice: Pioneer Materials can manufacture custom B₄C sputtering targets and ceramic materials according to specific customer requirements, including tailored purity, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for B₄C Materials
Contact Pioneer Materials to learn more about our high purity B₄C materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, protective coating, industrial engineering, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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