ZrO₂
ZrO₂ Zirconium Oxide Material for Advanced Energy and Thin Film Applications
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ZrO₂
Zirconium Oxide (ZrO₂)
Product Description
ZrO₂ is a high-performance ceramic oxide material composed of zirconium and oxygen, widely used in advanced semiconductor devices, thin film deposition, optical coatings, and high-temperature applications. These materials are valued for their high dielectric constant, excellent thermal stability, chemical inertness, and superior mechanical strength.
Product Specifications
Composition: Zr, O
Purity: 99.99%
Density: 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1mm, thickness: ±0.1mm
Surface Roughness: 32RMS
ZrO₂ Materials
High purity ZrO₂ material is designed for semiconductor manufacturing, thin film deposition, and advanced electronic applications. ZrO₂ belongs to the family of high-k dielectric oxide materials widely used in microelectronics, optical coatings, wear-resistant coatings, and integrated circuit technologies.
These materials are engineered to provide excellent dielectric properties, thermal stability, and chemical durability. By carefully controlling composition and microstructure, ZrO₂ materials can be optimized for both research and industrial applications.
This material is commonly used in semiconductor devices, optical coatings, protective films, and thin film deposition processes.
Applications of ZrO₂ Materials
ZrO₂ materials are widely used in advanced semiconductor and industrial technologies.
Common applications include:
- High-k dielectric thin films
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Optical coatings
- Wear-resistant and protective coatings
- High-temperature electronic components
- Advanced materials research and development
The ability to control the composition and microstructure of ZrO₂ allows engineers and researchers to optimize dielectric performance, thermal stability, mechanical strength, and chemical resistance for specialized applications.
ZrO₂ Sputtering Targets for Thin Film Deposition
ZrO₂ sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality dielectric and protective thin films with excellent composition uniformity and durability. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using ZrO₂ sputtering targets are commonly applied in semiconductor devices, optical coatings, protective layers, sensors, and next-generation electronic systems.
Notice: Pioneer Materials can manufacture custom ZrO₂ sputtering targets and compound materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for ZrO₂ Materials
Contact Pioneer Materials to learn more about our high purity ZrO₂ materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, optical coating, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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