ZnO
ZnO Zinc Oxide Material for Advanced Energy and Thin Film Applications
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ZnO
Zinc Oxide
ZnO
ZnO
Zinc Oxide (ZnO)
Product Description
ZnO is a wide bandgap oxide semiconductor material composed of zinc and oxygen, widely used in semiconductor manufacturing, transparent conductive films, optoelectronic devices, and thin film deposition applications. These materials are valued for their excellent optical transparency, high electron mobility, wide bandgap, piezoelectric properties, and chemical stability.
Product Specifications
Composition: Zn, O (various atomic ratios)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
ZnO Materials
High purity ZnO material is designed for semiconductor manufacturing, thin film deposition, and advanced optoelectronic applications. ZnO belongs to the family of oxide semiconductor materials widely used in transparent conductive films, ultraviolet photonic devices, piezoelectric components, and microelectronic systems.
These materials are engineered to provide excellent optical transparency, electrical performance, and long-term chemical stability. By carefully controlling composition and microstructure, ZnO materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, optoelectronic devices, and thin film deposition processes.
Applications of ZnO Materials
ZnO materials are widely used in advanced semiconductor, optoelectronic, and energy technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Transparent conductive oxide (TCO) films
- UV LEDs and ultraviolet photodetectors
- Piezoelectric devices and sensors
- Solar cells and photovoltaic devices
- Advanced materials research and development
The ability to control the composition of ZnO allows engineers and researchers to optimize electrical conductivity, optical transparency, piezoelectric performance, and thermal stability for specialized applications.
ZnO Sputtering Targets for Thin Film Deposition
ZnO sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality oxide thin films with excellent optical, electrical, and piezoelectric properties. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using ZnO sputtering targets are commonly applied in transparent conductive coatings, semiconductor devices, optoelectronics, photovoltaic systems, sensors, and advanced photonic technologies.
Notice: Pioneer Materials can manufacture custom ZnO sputtering targets and compound materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for ZnO Materials
Contact Pioneer Materials to learn more about our high purity ZnO materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, optoelectronic, transparent conductive coating, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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