TiO₂
TiO₂ Titanium Dioxide Material for Advanced Energy and Thin Film Applications
- Products
- Oxide Materials
- TiO₂
TiO₂
Titanium Dioxide (TiO₂)
Product Description
TiO₂ is a high performance oxide material composed of titanium and oxygen, widely used in semiconductor manufacturing, thin film deposition, optical coatings, and advanced electronic applications. These materials are valued for their high refractive index, excellent dielectric properties, chemical stability, photocatalytic activity, and outstanding resistance to corrosion and high temperatures.
Product Specifications
Composition: Ti, O (various atomic ratios)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
TiO₂ Materials Material
High purity TiO₂ material is designed for semiconductor manufacturing, thin film deposition, and advanced optical and electronic applications. TiO₂ belongs to the family of functional oxide materials widely used in optical coatings, dielectric layers, photocatalytic systems, and microelectronic devices.
These materials are engineered to provide excellent optical transparency, dielectric performance, and long-term chemical stability. By carefully controlling composition and microstructure, TiO₂ materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, optical systems, and thin film deposition processes.
Applications of TiO₂ Materials
TiO₂ materials are widely used in advanced semiconductor, optical, and energy technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Optical coatings and anti-reflective films
- High-k dielectric layers
- Photocatalytic coatings and environmental applications
- Sensors and microelectronic devices
- Advanced materials research and development
The ability to control the composition of TiO₂ allows engineers and researchers to optimize optical performance, dielectric properties, photocatalytic efficiency, and thermal stability for specialized applications.
TiO₂ Sputtering Targets for Thin Film Deposition
TiO₂ sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality oxide thin films with excellent optical, dielectric, and photocatalytic properties. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using TiO₂ sputtering targets are commonly applied in semiconductor devices, optical coatings, photovoltaic systems, sensors, dielectric layers, and advanced photonic technologies.
Notice: Pioneer Materials can manufacture custom TiO₂ sputtering targets and compound materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for TiO₂ Materials
Contact Pioneer Materials to learn more about our high purity TiO₂ materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, optical coating, photocatalytic, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
Call Us
+1-970-739-0393
Address
3357 Candlewood Road Torrance, CA 90505 USA