SiTe
SiTe Silicon Telluride Material for Advanced Energy and Thin Film Applications
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SiTe
Silicon Telluride (SiTe)
Product Description
SiTe is a chalcogenide semiconductor material composed of silicon and tellurium, widely used in thin film deposition, infrared optics, optoelectronic devices, and advanced semiconductor applications. These materials are valued for their tunable electrical properties, infrared transparency, thermal stability, and compatibility with emerging photonic technologies.
Product Specifications
Composition: Si, Te (various atomic ratios)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
SiTe Materials
High purity SiTe material is designed for semiconductor manufacturing, thin film deposition, and advanced optoelectronic applications. SiTe belongs to the family of chalcogenide semiconductor materials widely used in infrared optical systems, photonic devices, electronic components, and next-generation thin film technologies.
These materials are engineered to provide excellent optical performance, electrical conductivity, and chemical stability. By carefully controlling composition and microstructure, SiTe materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, infrared optical components, and thin film deposition processes.
Applications of SiTe Materials
SiTe materials are widely used in advanced semiconductor and photonic technologies.
Common applications include:
- Infrared optical devices
- Optoelectronic components
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Silicon photonics
- Optical sensing technologies
- Advanced materials research and development
The ability to control the composition of SiTe allows engineers and researchers to optimize optical transmission, electrical performance, and thermal stability for specialized applications.
SiTe Sputtering Targets for Thin Film Deposition
SiTe sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality semiconductor and chalcogenide thin films with excellent compositional uniformity. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using SiTe sputtering targets are commonly applied in infrared optical devices, photonic components, semiconductor devices, and next-generation electronic systems.
Notice: Pioneer Materials can manufacture custom SiTe sputtering targets and compound materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for SiTe Materials
Contact Pioneer Materials to learn more about our high purity SiTe materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, photonics, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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