SiO₂
SiO₂ Silicon Dioxide Material for Advanced Energy and Thin Film Applications
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SiO₂
Silicon Dioxide (SiO₂)
Product Description
SiO₂ is a high performance oxide material composed of silicon and oxygen, widely used in semiconductor manufacturing, thin film deposition, optical coatings, and advanced electronic applications. These materials are valued for their excellent electrical insulation, exceptional chemical stability, high optical transparency, and outstanding thermal resistance.
Product Specifications
Composition: Si, O (Silicon Dioxide)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
SiO₂ Materials
High purity SiO₂ material is designed for semiconductor manufacturing, thin film deposition, and advanced dielectric applications. SiO₂ belongs to the family of functional oxide materials widely used in integrated circuits, optical components, MEMS devices, and microelectronic technologies.
These materials are engineered to provide excellent dielectric performance, chemical durability, and optical transparency. By carefully controlling material purity and microstructure, SiO₂ materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, optical systems, and thin film deposition processes.
Applications of SiO₂ Materials
SiO₂ materials are widely used in advanced semiconductor and optical technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Dielectric and insulating layers
- Optical coatings and optical components
- Passivation layers for semiconductor devices
- MEMS and microelectronic devices
- Advanced materials research and development
The ability to control the purity of SiO₂ allows engineers and researchers to optimize dielectric performance, optical transparency, thermal stability, and thin film quality for specialized applications.
SiO₂ Sputtering Targets for Thin Film Deposition
SiO₂ sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality oxide thin films with excellent dielectric properties, optical transparency, and chemical stability. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using SiO₂ sputtering targets are commonly applied in semiconductor devices, optical coatings, integrated circuits, MEMS devices, photonic components, and advanced electronic systems.
Notice: Pioneer Materials can manufacture custom SiO₂ sputtering targets and oxide materials according to specific customer requirements, including tailored purity, density, dimensions, backing plate bonding, and custom geometries.
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