MgO
MgO Magnesium Oxide Material for Advanced Energy and Thin Film Applications
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MgO
Magnesium Oxide (MgO)
Product Description
MgO is a high performance oxide ceramic material composed of magnesium and oxygen, widely used in semiconductor manufacturing, thin film deposition, spintronic devices, and advanced electronic applications. These materials are valued for their excellent electrical insulation, high thermal conductivity, outstanding chemical stability, and compatibility with epitaxial thin film growth.
Product Specifications
Composition: Mg, O (various atomic ratios)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
MgO Materials
High purity MgO material is designed for semiconductor manufacturing, thin film deposition, and advanced insulating and spintronic applications. MgO belongs to the family of functional oxide materials widely used in magnetic tunnel junctions, insulating layers, optical coatings, and microelectronic devices.
These materials are engineered to provide excellent dielectric performance, thermal stability, and crystallographic compatibility with magnetic thin films. By carefully controlling composition and microstructure, MgO materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, spintronic devices, and thin film deposition processes.
Applications of MgO Materials
MgO materials are widely used in advanced semiconductor, magnetic, and optical technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Magnetic tunnel junctions (MTJs)
- Tunnel barrier layers for spintronic devices
- Optical coatings and insulating films
- Microelectronics and MEMS devices
- Advanced materials research and development
The ability to control the composition of MgO allows engineers and researchers to optimize dielectric performance, thermal conductivity, electrical insulation, and crystal quality for specialized applications.
MgO Sputtering Targets for Thin Film Deposition
MgO sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality oxide thin films with excellent insulating, dielectric, and epitaxial properties. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using MgO sputtering targets are commonly applied in magnetic tunnel junctions, spintronic devices, semiconductor components, optical coatings, insulating layers, and advanced photonic systems.
Notice: Pioneer Materials can manufacture custom MgO sputtering targets and compound materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for MgO Materials
Contact Pioneer Materials to learn more about our high purity MgO materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, spintronic, optical coating, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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