LiTaO₃
LiTaO₃ Lithium Tantalate Material for Advanced Energy and Thin Film Applications
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LiTaO₃
Lithium Tantalate
LiTaO₃
LiTaO₃
Lithium Tantalate (LiTaO₃)
Product Description
LiTaO₃ is a high performance piezoelectric oxide crystal composed of lithium, tantalum, and oxygen, widely used in semiconductor manufacturing, thin film deposition, RF communication devices, and photonic applications. These materials are valued for their excellent piezoelectric properties, high electromechanical coupling, outstanding thermal stability, and exceptional optical performance.
Product Specifications
Composition: Li, Ta, O (Lithium Tantalate)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
LiTaO₃ Materials
High purity LiTaO₃ material is designed for semiconductor manufacturing, thin film deposition, and advanced piezoelectric and optical applications. LiTaO₃ belongs to the family of functional oxide materials widely used in SAW devices, optical communication systems, electro-optic modulators, infrared detectors, and frequency control technologies.
These materials are engineered to provide excellent piezoelectric response, electro-optic performance, and thermal stability. By carefully controlling composition and crystal quality, LiTaO₃ materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, photonic devices, and thin film deposition processes.
Applications of LiTaO₃ Materials
LiTaO₃ materials are widely used in advanced semiconductor, photonic, and communication technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Surface acoustic wave (SAW) devices
- Optical modulators and electro-optic components
- Infrared detectors and optical sensors
- RF communication and frequency control devices
- Advanced materials research and development
The ability to control the composition of LiTaO₃ allows engineers and researchers to optimize piezoelectric response, optical performance, thermal stability, and device efficiency for specialized applications.
LiTaO₃ Sputtering Targets for Thin Film Deposition
LiTaO₃ sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality piezoelectric and electro-optic thin films with excellent compositional uniformity and crystal quality. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using LiTaO₃ sputtering targets are commonly applied in SAW devices, optical waveguides, electro-optic modulators, RF filters, photonic components, and advanced sensing systems.
Notice: Pioneer Materials can manufacture custom LiTaO₃ sputtering targets and piezoelectric materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
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