CrON
CrON Chromium Oxynitride Material for Advanced Energy and Thin Film Applications
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CrON
Chromium Oxynitride
CrON
CrON
Chromium Oxynitride (CrON)
Product Description
CrON is a high performance chromium oxynitride material composed of chromium, oxygen, and nitrogen, widely used in semiconductor manufacturing, thin film deposition, decorative coatings, and advanced surface engineering applications. These materials are valued for their excellent hardness, superior wear resistance, outstanding corrosion resistance, and high thermal stability.
Product Specifications
Composition: Cr, O, N (Chromium Oxynitride)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
CrON Materials
High purity CrON material is designed for semiconductor manufacturing, thin film deposition, and advanced coating applications. CrON belongs to the family of chromium-based oxynitride materials widely used in wear-resistant coatings, semiconductor processing equipment, optical coatings, and corrosion-resistant surfaces.
These materials are engineered to provide excellent hardness, oxidation resistance, chemical durability, and thermal stability. By carefully controlling material composition and microstructure, CrON materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, protective coating technologies, and thin film deposition processes.
Applications of CrON Materials
CrON materials are widely used in advanced semiconductor and industrial technologies.
Common applications include:
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Wear-resistant and protective coatings
- Optical and decorative coatings
- Corrosion-resistant surface treatments
- Semiconductor processing equipment
- Advanced materials research and development
The ability to control the composition of CrON allows engineers and researchers to optimize hardness, corrosion resistance, optical performance, and thermal stability for specialized applications.
CrON Sputtering Targets for Thin Film Deposition
CrON sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality oxynitride thin films with excellent hardness, oxidation resistance, and surface durability. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using CrON sputtering targets are commonly applied in semiconductor devices, optical coatings, wear-resistant tools, decorative finishes, industrial components, and advanced engineering systems.
Notice: Pioneer Materials can manufacture custom CrON sputtering targets and oxynitride materials according to specific customer requirements, including tailored purity, density, dimensions, backing plate bonding, and custom geometries.
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Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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