AsSe
AsSe Arsenic Selenide Material for Advanced Energy and Thin Film Applications
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AsSe
Arsenic Selenide (AsSe)
Product Description
AsSe is a chalcogenide semiconductor material composed of arsenic and selenium, widely used in infrared optics, optical fibers, photonic devices, and thin film deposition applications. These materials are valued for their excellent infrared transparency, high refractive index, optical nonlinearity, and thermal stability.
Product Specifications
Composition: As, Se (various atomic ratios)
Purity: ≥ 99.99%
Density: ≥ 90% theoretical density
Dimension: OD 50.8 mm – 450.0 mm
Tolerance diameter: ±0.1 mm
Thickness tolerance: ±0.1 mm
Surface Roughness: 32 RMS
AsSe Materials
High purity AsSe material is designed for semiconductor manufacturing, thin film deposition, and advanced photonic applications. AsSe belongs to the family of chalcogenide glass materials widely used in infrared optics, optical fibers, waveguides, and photonic sensing technologies.
These materials are engineered to provide excellent optical transparency, stable electrical characteristics, and reliable thermal performance. By carefully controlling composition and microstructure, AsSe materials can be optimized for both research and industrial applications.
This material is commonly used in advanced electronics, semiconductor research, infrared optical components, and thin film deposition processes.
Applications of AsSe Materials
AsSe materials are widely used in advanced semiconductor and photonic technologies.
Common applications include:
- Infrared optical components
- Optical fibers and waveguides
- Optical sensing devices
- Silicon photonics
- Semiconductor and thin film research
- Thin film deposition and sputtering targets
- Nonlinear optical devices
- Advanced materials research and development
The ability to control the composition of AsSe allows engineers and researchers to optimize optical transparency, refractive index, thermal stability, and device performance for specialized applications.
AsSe Sputtering Targets for Thin Film Deposition
AsSe sputtering targets are used in physical vapor deposition (PVD) processes to produce high quality chalcogenide thin films with excellent compositional uniformity and optical performance. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using AsSe sputtering targets are commonly applied in infrared optical devices, optical waveguides, photonic sensors, integrated photonic circuits, and next-generation semiconductor technologies.
Notice: Pioneer Materials can manufacture custom AsSe sputtering targets and compound materials according to specific customer requirements, including tailored composition, density, dimensions, backing plate bonding, and custom geometries.
Request a Quote for AsSe Materials
Contact Pioneer Materials to learn more about our high purity AsSe materials and custom sputtering targets. Our team can provide customized compositions, dimensions, bonding options, and manufacturing solutions designed to meet your semiconductor, photonics, infrared optics, and advanced thin film deposition requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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