
(Zn,Mg)O zinc magnesium oxide sputtering targets are engineered for thin film deposition, optoelectronic systems, and wide bandgap semiconductor applications. Pioneer Materials, Inc. supplies high purity (Zn,Mg)O materials with customizable compositions, dimensions, and bonding options for research laboratories and advanced manufacturing environments.
(Zn,Mg)O zinc magnesium oxide sputtering targets from Pioneer Materials, Inc. are designed for advanced thin film deposition, ultraviolet optoelectronics, and semiconductor device fabrication. As a tunable wide bandgap semiconductor alloy, (Zn,Mg)O is widely utilized in UV photodetectors, transparent electronic systems, and high performance optoelectronic applications requiring controlled optical and electronic properties.
(Zn,Mg)O is a zinc magnesium oxide semiconductor alloy formed by combining zinc oxide (ZnO) and magnesium oxide (MgO). By adjusting the Zn-to-Mg ratio, the bandgap of the material can be precisely controlled, allowing optimization for ultraviolet and high energy electronic applications.
(Zn,Mg)O materials are recognized for their optical transparency, electron mobility, and resistance to radiation exposure. These characteristics make them suitable for UV detection systems, semiconductor heterostructures, transparent electronics, and advanced optoelectronic technologies requiring tunable electronic and optical performance.
(Zn,Mg)O sputtering targets are manufactured for precision thin film deposition processes including magnetron sputtering, physical vapor deposition (PVD), and semiconductor coating applications. These high purity sputtering targets are engineered to support controlled film composition, stable deposition performance, and reliable semiconductor properties across research and industrial environments.
(Zn,Mg)O sputtering targets are widely used in ultraviolet photonic systems, transparent conductive layers, and semiconductor thin film development. Their tunable bandgap and optical characteristics make them suitable for UV sensors, optoelectronic coatings, and high electron mobility device structures.
Thin films produced using (Zn,Mg)O sputtering targets are frequently utilized in ultraviolet photodetectors, transparent electronics, semiconductor heterostructures, and next-generation electronic technologies.
| Specification | Details |
|---|---|
| Material | Zinc Magnesium Oxide |
| Product Type | Sputtering Target |
| Chemical Formula | (Zn,Mg)O |
| Purity | Up to 99.99% |
| Shape | Disc, Planar, Rotary, Custom Shapes |
| Size | 50.8 mm – 300 mm |
| Composition | ZnO and MgO with tailored atomic ratios |
| Application | Thin Film Deposition, UV Optoelectronics, Semiconductor Research |
| Category | Wide Bandgap Oxide Semiconductor Materials |
| Bonding | Indium Bonding, Elastomer Bonding, Custom Backing Plates Available |
Pioneer Materials, Inc. manufactures custom (Zn,Mg)O sputtering targets and compound materials according to customer-specific research and production requirements. Available customization options include tailored purity levels, Zn-to-Mg compositions, target dimensions, densities, and geometries for specialized thin film deposition applications. Additional services include custom backing plates, indium bonding, elastomer bonding, and target assembly solutions designed to support semiconductor manufacturing, optoelectronic systems, and advanced ultraviolet device technologies.