(Zn,Mg)O​ Sputtering Targets

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(Zn,Mg)O​ Sputtering Targets

(Zn,Mg)O​ Sputtering Targets Product Information

(Zn,Mg)O zinc magnesium oxide sputtering targets are engineered for thin film deposition, optoelectronic systems, and wide bandgap semiconductor applications. Pioneer Materials, Inc. supplies high purity (Zn,Mg)O materials with customizable compositions, dimensions, and bonding options for research laboratories and advanced manufacturing environments.

(Zn,Mg)O Zinc Magnesium Oxide Sputtering Targets Product Information

(Zn,Mg)O zinc magnesium oxide sputtering targets from Pioneer Materials, Inc. are designed for advanced thin film deposition, ultraviolet optoelectronics, and semiconductor device fabrication. As a tunable wide bandgap semiconductor alloy, (Zn,Mg)O is widely utilized in UV photodetectors, transparent electronic systems, and high performance optoelectronic applications requiring controlled optical and electronic properties.

(Zn,Mg)O Material Overview

(Zn,Mg)O is a zinc magnesium oxide semiconductor alloy formed by combining zinc oxide (ZnO) and magnesium oxide (MgO). By adjusting the Zn-to-Mg ratio, the bandgap of the material can be precisely controlled, allowing optimization for ultraviolet and high energy electronic applications.

(Zn,Mg)O materials are recognized for their optical transparency, electron mobility, and resistance to radiation exposure. These characteristics make them suitable for UV detection systems, semiconductor heterostructures, transparent electronics, and advanced optoelectronic technologies requiring tunable electronic and optical performance.

Product Description

(Zn,Mg)O sputtering targets are manufactured for precision thin film deposition processes including magnetron sputtering, physical vapor deposition (PVD), and semiconductor coating applications. These high purity sputtering targets are engineered to support controlled film composition, stable deposition performance, and reliable semiconductor properties across research and industrial environments.

(Zn,Mg)O sputtering targets are widely used in ultraviolet photonic systems, transparent conductive layers, and semiconductor thin film development. Their tunable bandgap and optical characteristics make them suitable for UV sensors, optoelectronic coatings, and high electron mobility device structures.

Thin films produced using (Zn,Mg)O sputtering targets are frequently utilized in ultraviolet photodetectors, transparent electronics, semiconductor heterostructures, and next-generation electronic technologies.

Product Specifications

Specification Details
Material Zinc Magnesium Oxide
Product Type Sputtering Target
Chemical Formula (Zn,Mg)O
Purity Up to 99.99%
Shape Disc, Planar, Rotary, Custom Shapes
Size 50.8 mm – 300 mm
Composition ZnO and MgO with tailored atomic ratios
Application Thin Film Deposition, UV Optoelectronics, Semiconductor Research
Category Wide Bandgap Oxide Semiconductor Materials
Bonding Indium Bonding, Elastomer Bonding, Custom Backing Plates Available

Applications of (Zn,Mg)O Zinc Magnesium Oxide Sputtering Targets

  • Ultraviolet (UV) photodetectors
  • Transparent electronics and conductive layers
  • Semiconductor heterostructures
  • High electron mobility device applications
  • Optoelectronic and optical thin film systems
  • Semiconductor and thin film research
  • Advanced materials research and laboratory development

Custom Manufacturing Options

Pioneer Materials, Inc. manufactures custom (Zn,Mg)O sputtering targets and compound materials according to customer-specific research and production requirements. Available customization options include tailored purity levels, Zn-to-Mg compositions, target dimensions, densities, and geometries for specialized thin film deposition applications. Additional services include custom backing plates, indium bonding, elastomer bonding, and target assembly solutions designed to support semiconductor manufacturing, optoelectronic systems, and advanced ultraviolet device technologies.

(Zn,Mg)O​ Sputtering Targets

Request a Quote for (Zn,Mg)O​ Sputtering Targets
Pioneer Materials supplies custom sputtering targets for research, development, and production applications. Submit your requirements for (Zn,Mg)O​ Sputtering Targets, including target dimensions, purity level, composition, quantity, backing plate needs, and bonding specifications. We will review your request and respond with pricing, availability, and manufacturing options.
Pioneer Materials, Inc. works with laboratories, research institutions, manufacturers, and technology companies that require reliable sputtering target materials for advanced thin film deposition. Our team supports custom (Zn,Mg)O​ Sputtering Targets requests with attention to composition, consistency, target geometry, and application requirements, helping customers source specialty materials with confidence.
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