BaTiO₃
BaTiO₃ Barium Titanate Material for Advanced Ferroelectric and Thin Film Applications
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BaTiO₃
BaTiO₃ Barium Titanate (BaTiO₃)
Product Description
BaTiO₃ is a ferroelectric ceramic material composed of barium and titanium oxide used in electronic components, semiconductor devices, and thin film applications. It is widely known for its excellent dielectric properties, high permittivity, and strong ferroelectric behavior.
Product Specifications
Composition: BaO, TiO2 (various molar ratio)
Purity: 99.95%
Density: 95% theoretical density
Dimension: custom tailored
Tolerance diameter: +/-0.1mm
Surface Roughness: 32 RMS
BaTiO₃ Material
High purity BaTiO₃ material designed for semiconductor manufacturing, thin film deposition, and advanced electronic applications. BaTiO₃ belongs to the family of ferroelectric oxide materials widely used in capacitors, sensors, and advanced electronic devices.
BaTiO₃ materials are engineered to provide excellent dielectric properties, ferroelectric behavior, and thermal stability. By carefully controlling the composition and microstructure of barium and titanium oxide, the electrical and functional properties of the material can be optimized for specific research or industrial applications.
This material is commonly used in advanced electronics, semiconductor research, capacitors, piezoelectric devices, and thin film deposition processes.
Applications of BaTiO₃ Materials
BaTiO₃ materials are widely used in advanced electronics and functional oxide technologies.
Common applications include:
- Multilayer ceramic capacitors (MLCCs)
- Ferroelectric and piezoelectric devices
- Thin film deposition and oxide electronics
- Semiconductor and thin film research
- Sensors and actuators
- Advanced materials research and development
The ability to control the composition and structure of BaTiO₃ allows engineers and researchers to optimize dielectric performance, ferroelectric properties, and device efficiency for specialized applications.
BaTiO₃ Sputtering Targets for Thin Film Deposition
BaTiO₃ sputtering targets are used in thin film deposition processes to create high quality ferroelectric and dielectric films. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.
Thin films produced using BaTiO₃ sputtering targets are commonly applied in capacitors, sensors, actuators, and next generation electronic devices.
Notice: Pioneer Materials can manufacture custom sputtering targets and compound materials according to specific customer requirements, including tailored density, composition, and dimensions.
Request a Quote for BaTiO₃ Materials
Contact Pioneer Materials to learn more about our high purity BaTiO₃ materials and custom sputtering targets. Our team can provide tailored compositions, dimensions, and manufacturing solutions designed to meet your research or industrial requirements.
Request a Quote
Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.
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