Ti Boride Sputtering Targets
Ti Boride Sputtering Targets
Ti Boride Sputtering Targets
Ti Boride Sputtering Targets Product Information
TiB₂ titanium diboride sputtering targets are engineered for thin film deposition, protective coatings, and advanced materials research. Pioneer Materials, Inc. supplies high purity TiB₂ materials with customizable dimensions, densities, and bonding options for research laboratories and industrial manufacturing environments.
TiB₂ Titanium Diboride Sputtering Targets Product Information
TiB₂ titanium diboride sputtering targets from Pioneer Materials, Inc. are designed for advanced thin film deposition, protective coating applications, and materials research. As a hard ceramic boride material, TiB₂ is widely used in thin film technologies requiring excellent wear resistance, thermal stability, and oxidation resistance.
Titanium Diboride (TiB₂) Material Overview
Titanium diboride (TiB₂) is a refractory ceramic material composed of titanium and boron. It is recognized for its high hardness, excellent thermal stability, good electrical conductivity, and strong resistance to wear and oxidation. These properties make TiB₂ a valuable material for advanced coatings, semiconductor processes, and high-performance thin film applications.
TiB₂ is commonly used as a sputtering target material for depositing durable coatings and functional thin films in research and industrial environments. Its combination of mechanical strength and thermal resistance supports applications where long-term material stability is important.
Product Description
TiB₂ titanium diboride sputtering targets are manufactured for precision thin film deposition processes including magnetron sputtering, physical vapor deposition (PVD), and advanced coating applications. These high purity sputtering targets are engineered to provide consistent composition, stable deposition performance, and reliable film quality across a wide range of research and production environments.
TiB₂ sputtering targets are widely used to deposit hard, wear-resistant, and thermally stable coatings for electronics, tooling, and advanced materials development. The material’s ceramic characteristics make it suitable for applications requiring durable surface protection and high-temperature performance.
Thin films produced using TiB₂ sputtering targets are commonly utilized in protective coatings, semiconductor research, tribological coatings, and advanced materials engineering applications.
Product Specifications
| Specification | Details |
|---|---|
| Material | Titanium Diboride |
| Product Type | Sputtering Target |
| Chemical Formula | TiB₂ |
| Purity | Up to 99.9%+ |
| Shape | Disc, Planar, Rotary, Custom Shapes |
| Size | Custom Tailored |
| Composition | Titanium and Boron |
| Application | Thin Film Deposition, Protective Coatings, Materials Research |
| Category | Boride Ceramic Materials |
| Bonding | Indium Bonding, Elastomer Bonding, Custom Backing Plates Available |
Applications of TiB₂ Titanium Diboride Sputtering Targets
- Wear-resistant thin film coatings
- Protective surface coatings
- Semiconductor and thin film research
- High-temperature coating applications
- Tribological and low-wear surface engineering
- Advanced ceramic and boride materials research
- Industrial coating and materials development programs
Custom Manufacturing Options
Pioneer Materials, Inc. manufactures custom TiB₂ sputtering targets and boride materials according to customer-specific research and production requirements. Available customization options include tailored purity levels, target dimensions, densities, and geometries for specialized thin film deposition applications. Additional services include custom backing plates, indium bonding, elastomer bonding, and target assembly solutions designed to support semiconductor manufacturing, advanced coating development, and industrial thin film production.