MoPₓ

MoPₓ Molybdenum Phosphide Material for Advanced Energy and Thin Film Applications

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Molybdenum Phosphide

Mo, P

MoPₓ

MoPₓ Molybdenum Phosphide (MoPₓ)

Product Description

MoPₓ is a transition metal phosphide material widely used in advanced energy, catalytic, and thin film applications. It exhibits excellent electrical conductivity, catalytic activity, and chemical stability, making it suitable for electrochemical systems, energy conversion, and semiconductor processes.

Product Specifications

Composition: Mo, P (various atomic ratios)
Purity: 99.99%
Density: 90% theoretical density
Dimension: OD 50.8mm – 450.0mm
Tolerance diameter: +/-0.1mm thickness: +/10.1mm
Surface Roughness: 32 RMS

MoPₓ Material

High purity MoPₓ material designed for semiconductor manufacturing, thin film deposition, and advanced energy applications. MoPₓ belongs to the family of transition metal phosphide materials widely used in catalysis, energy conversion, and electrochemical systems.

MoPₓ materials are engineered to provide excellent electrical conductivity, catalytic activity, and chemical stability. By carefully controlling the ratio of molybdenum and phosphorus, the electrochemical and catalytic performance of the material can be optimized for specific research or industrial applications.

This material is commonly used in advanced electronics, semiconductor research, energy conversion systems, and thin film deposition processes.

Applications of MoPₓ Materials

MoPₓ materials are widely used in advanced energy and electrochemical technologies.
Common applications include:

  • Electrocatalysis and hydrogen evolution reaction (HER)
  • Energy conversion and storage systems
  • Semiconductor and thin film research
  • Catalytic materials development
  • Advanced materials research and development


The ability to control the composition of MoPₓ allows engineers and researchers to optimize conductivity, catalytic efficiency, and performance for specialized applications.

MoPₓ Sputtering Targets for Thin Film Deposition

MoPₓ sputtering targets are used in thin film deposition processes to create high quality conductive and catalytic films. These targets enable precise control of material composition during deposition, making them ideal for research laboratories, semiconductor manufacturing environments, and advanced materials development.

Thin films produced using MoPₓ sputtering targets are commonly applied in catalytic systems, energy devices, and advanced electronic applications.

Notice: Pioneer Materials can manufacture custom sputtering targets and compound materials according to specific customer requirements, including tailored density, composition, and dimensions.

Request a Quote for MoPₓ Materials

Contact Pioneer Materials to learn more about our high purity MoPₓ materials and custom sputtering targets. Our team can provide tailored compositions, dimensions, and manufacturing solutions designed to meet your energy conversion, catalytic, and thin film application requirements.

Request a Quote

Please fill out the form with your specific requirements, and our dedicated team will promptly review your request and provide you with a comprehensive quotation tailored to your needs. We are committed to delivering the highest quality materials and exceptional service to meet your unique demands.

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