Our Sputtering

Sputtering Targets for
Thin Film Dposition

PMI produces high quality sputtering targets from manufacturing locations in the United States, China, and Taiwan. Targets are made to specific compositions per customer requests as well as from standard alloy compositions. Targets are made to various dimensions and purity levels depending on customer requirements. PMI’s sputtering targets are used for optical media as well as various LCD applications.

Materials Include:

• ZnS-SiO₂ (dielectric layers for CD-RW and DVD-RW)
• Phase Change alloys for CD-RW (Ag, Ge, Te, Sb, etc.)
• Phase Change alloys for DVD-RW (Sb, Ge, Sn, etc.)
• ITO (indium-tin-oxide)

Material Performance
Our targets are characterized by their High Performance (Hi-P) attributes. Our target density (essential for keeping particle levels low) is second to none. Our materials consistency (essential for film uniformity) is the highest in the industry.

Conventional targets have inconsistent materials structure	PMI microstructure shows high material consistency

Performance Optimization
PMI Hi-P targets give better target utilization due to higher density and better material consistency.